Features
• Fully digital technology • Precisely control all ionization parameters with expansive data output capabilities
• S ingle-crystal silicon emitter points available
• Ulra-clean emitter material provides the most compatible, and lowest maintenance available; essential for leadingedge wafer processing applications
• Advanced Feedback Technology • C ontinued stable high ion output is ensured, along with the most balanced ionization performance possible
• Flexible user configuration with adjustments made via IR Remote, IonManager software, or Handheld Terminal
• Fast and easy setup
• Current/voltage-controlled performance
• Safe, reliable operation
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